Area Dependent Low Frequency Noise in Metal Oxide Based Resistive Random Access Memory
Keywords:
Current conduction, low frequency noise, resistive switching memoryAbstract
Metal oxide based resistance random access memory (RRAM) has been extensively studied as one of the most promising candidate for next generation nonvolatile memory; however the current conduction mechanism is not yet clearly understood. To tackle this problem, low frequency noise behavior in metal oxide based RRAM device has been investigated in this work. Together with DC current voltage characteristics, it confirms that for the low resistance state, current conduction is localized without an area dependence, whereas, for the high resistance state, it is a uniform leakage current throughout the whole device area. This is consistent with the filament type resistive switching phenomenon in such devices.
Downloads
Downloads
Published
Issue
Section
License
You are free to:
- Share — copy and redistribute the material in any medium or format for any purpose, even commercially.
- Adapt — remix, transform, and build upon the material for any purpose, even commercially.
- The licensor cannot revoke these freedoms as long as you follow the license terms.
Under the following terms:
- Attribution — You must give appropriate credit , provide a link to the license, and indicate if changes were made . You may do so in any reasonable manner, but not in any way that suggests the licensor endorses you or your use.
- No additional restrictions — You may not apply legal terms or technological measures that legally restrict others from doing anything the license permits.
Notices:
You do not have to comply with the license for elements of the material in the public domain or where your use is permitted by an applicable exception or limitation .
No warranties are given. The license may not give you all of the permissions necessary for your intended use. For example, other rights such as publicity, privacy, or moral rights may limit how you use the material.